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Adjusting aligner optics is vital to precise, high yield wafer processing. OAI's Model 311 Intensity Profiler combines superb human engineering and measurement accuracy expressly for that purpose. It employs a unique bar-graph display that presents a graphic portrayal of the percent deviation of each intensity level from a reference plane. The companion nine-sensor probe enables the user to continuously measure light intensity at nine points on the wafer plane.

MODEL 311 PROBE with nine Individual Sensors:
P311-3-NVU 3" NUV Probe choice: 365, 400, 436nm
P311-4-NUV 4" NUV Probe choice: 365, 400, 436nm
P311-5-NUV 5" NUV Probe choice: 365, 400, 436nm
P311-6-NUV 6" NUV Probe choice: 365, 400, 436nm
P311-8-NUV 8" NUV Probe choice: 365, 400, 436nm

P311-3-310 MUV 3" MUV probe: 310nm
P311-4-310 MUV 4" MUV probe: 310nm
P311-5-310 MUV 5" MUV probe: 310nm
P311-6-310 MUV 6" MUV probe: 310nm
P311-8-310 MUV 8" MUV probe: 310nm

P311-3-DUV 3" DUV Probe choice: 220, 260nm
P311-4-DUV 4" DUV Probe choice: 220, 260nm
P311-5-DUV 5" DUV Probe choice: 220, 260nm
P311-6-DUV 6" DUV Probe choice: 220, 260nm
P311-8-DUV 8" DUV Probe choice: 220, 260nm

FEATURES AND SPECIFICATIONS
• Speeds adjustment of aligner optics
• Measures both intensity and total energy
• Employs unique nine-column, LED bar-graph display
• Optimizes high-yield photolithography
• Serves contact/proximity aligners and other exposure sources
• Choice of probe tuned to desired spectral response