Photolithography » UV Exposure » UV Exposure Meters » OAI » List » 316
Originally designed for use with the Series 100, 200 and 300 Perkin-Elmer Projection Mask Aligners, the microprocessor-based Model 316 Exposure Analyzer monitor allows storage and recall of multiple exposure parameters (intensity, energy, and time) collected from the exposure series. It calculates percent deviation and averages energy. AC or battery operation. For 310, 365, 380, 400, and 436 nm wavelengths. Other wavelengths are available.
Probe choice: 310, 365, 380, 400, 420, 436nm
FEATURES AND SPECIFICATIONS
• Averages up to 9 exposures
• Digital display provides clear, NIST traceable measurements
• Measures Intensity, Time, and Energy
• Records % deviation over a series of exposures
• Probe wavelength display helps prevent errors in setup
• Simple push button operation provides reliable results
• RS 232 output to download and record analyzer measurement results
• Detachable probes to match the spectral response of many photoresists
• Display readings can be frozen
• Front panel reminders prompt the user
• Rugged aluminum case features handle and probe pouch for portability







