Warning: mysql_num_rows() expects parameter 1 to be resource, boolean given in /www/htdocs/spseur/http/net-book_mod0.php on line 1787 Warning: mysql_fetch_array() expects parameter 1 to be resource, boolean given in /www/htdocs/spseur/http/net-book_mod0.php on line 1794
UV meter For Perkin-Elmer Projection Mask Aligner
Photolithography » UV Exposure » UV Exposure Meters » OAI » List » 316

List

Originally designed for use with the Series 100, 200 and 300 Perkin-Elmer Projection Mask Aligners, the microprocessor-based Model 316 Exposure Analyzer monitor allows storage and recall of multiple exposure parameters (intensity, energy, and time) collected from the exposure series. It calculates percent deviation and averages energy. AC or battery operation. For 310, 365, 380, 400, and 436 nm wavelengths. Other wavelengths are available.

Probe choice: 310, 365, 380, 400, 420, 436nm

FEATURES AND SPECIFICATIONS
• Averages up to 9 exposures
• Digital display provides clear, NIST traceable measurements
• Measures Intensity, Time, and Energy
• Records % deviation over a series of exposures
• Probe wavelength display helps prevent errors in setup
• Simple push button operation provides reliable results
• RS 232 output to download and record analyzer measurement results
• Detachable probes to match the spectral response of many photoresists
• Display readings can be frozen
• Front panel reminders prompt the user
• Rugged aluminum case features handle and probe pouch for portability

Shop: Photolithography
Part number: 316
Product: UV meter
Model: For Perkin-Elmer Projection Mask Aligner
Category: UV Exposure Meters