List

The OAI Model 2000 may be configured as either an edge-bead exposure tool or a flood exposure system; both configurations are based on a proven, time-tested platform.

The Model 2000 systems include a UV lightsource, intensity controlling power supply and robotic substrate handling subsystem. UV lightsources provide adjustable intensity beams with divergence half-angles of <2.0%. Power supplies are available from 200W to 2,000W. Intensity controller sensors are linked directly to the lightsource for accurate intensity monitoring. The OAI robotic substrate handling system is microprocessor controlled and may be programmed to accommodate a wide variety of substrate sizes. The shadow mask capability enables the user to pattern the top-side of a substrate while being held in very close proximity to the mask. At a separation of 25 microns, these systems are capable of 6 micron resolution.

2000FL Flood Exposure Systems are used to augment and/or enhance the photolithography processes in both production and R&D settings. Applications include photoresist stabilization and modification, image reversal and PCM processes.

FEATURES AND SPECIFICATIONS

• The system has only one moving component.
• Uniform, Repeatable exposures.
• Intensity controlling power supply drives the UV exposure system.
• System is easy to operate and requires very little maintenance.