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Chemical Etch Wafer Holder Basic II, PTFE Frame, no Glass Lid
Wetprocess » Processing » Processing: Holder, Single Wfr » SILICET » List » SIL-IICxB4
Wetprocess » Processing » Processing: Holder, Single Wfr » SILICET » List » SIL-IICxB4
Our patented Single Wafer Holder BASIC II is a handling tool created for chemical etching of silicon wafers. The wafer disks are held securely by means of a vacuum, thus also protecting them reliably from the etching agent. The protected area behind the wafer is ventilated to provide pressure compensation. Penetrating fluids, e.g. after a membrane fracture, can be removed by means of a cannula and a gear or hose pump (see accessories also).
Equipment:
Seals: EPDM peroxide cured and sulfure-free
Supply Line: 3 Norprene-connecting tubes
Rack: PTFE-modified
Models for 3", 4", 6", 8" wafers.
