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Chemical Etch Wafer Holder Plus II, PTFE Frame, no Glass Lid
Wetprocess » Processing » Processing: Holder, Single Wfr » SILICET » List » SIL-IICxB4C2
Wetprocess » Processing » Processing: Holder, Single Wfr » SILICET » List » SIL-IICxB4C2
Our patented Single Wafer Holder PLUS II with easy exchangeable seals, is a new generation of holding device. Created for chemical etching of silicon wafers. The wafer are held securely by means of a vacuum, thus also protecting them reliably from the etching agent. The Wafer Holder PLUS II is equipped with an additional seal, which protects the entire wafer front including the edge from the etching agent. The protected area behind the wafer is ventilated to provide pressure compensation.
Equipment:
Seals: EPDM peroxide cured and sulfure-free
Supply Line: 3 Norprene-connecting tubes
Rack: PTFE-modified
Cover: Glass / PTFE-modified
Models for 3", 4", 6", 8" wafers.
