Spincoater Up to 150mm
Photolithography » Coating » Single Wafer Spin Coaters » APT » List » SPIN150
Photolithography » Coating » Single Wafer Spin Coaters » APT » List » SPIN150
Single Substrate Spin Processor:
SPIN150-NPP
The SPIN150 single substrate spin processor is perfectly suitable for a wide range of applications, including drying, rinsing, cleaning, and coating.
This table-top spin processor is seamless build in a full-plastic, housing in natural polypropylene (NPP) or optional PTFE,and is suitable for processing fragments as small as 5mm up to substrates sizes up to Ø160mm (or 6”) or 4"x4".
Available models & materials:
-
SPIN150-NPP Table-Top Model NPP

- SPIN150-PTFE Table-Top Model PTFE
- SPIN150-NPP-IND In-Deck NPP
- SPIN150-PTFE-INDIn-Deck PTFE
Specifications:
- Max. substrate diameter: 160mm
- Max. process chamber diameter: 202mm
- Servo-controlled motor
-
Programmable digital process controller:
- Storage of 50 programs of 99 step recipes each
- Speed 1-10.000 rpm
- 2 free programmable outputs (dry contacts)
- Dimensions: 275 (w) x 240 (d) x 450 (h) mm
Chucks & Adapters:
- Vacuum Chuck A-V36-S45-PP up to Ø150mm (included)
- Fragment Adapter D-V10-S50-PP for fragments (Ø >10mm up to <1”) of Semi Standard Wafer, 300-700µm (included)
- Small Fragment Adapter D-V2.5-S50-PP for fragments (Ø>3mm up to 15mm) (optional)
- Vacuum Chuck A-V87-S96-PP for larger substrates up to Ø200mm (optional)
Processes:
Drying, Rinsing, Coating, Cleaning
Please refer to our website www.spincoating.com for further details.






