Automated, ultra-fast & accurate mapping of thickness, refractive index, uniformity, and other optical properties of film and coating on a semiconductor wafer. Our film thickness scanner offers 625 measurements per minute on an 8 inch wafer.
Excellent film thickness mapping
At high speed
Allows you to work off-line on your data or video
"Developed and manufactured in Europe by a spin-off institute of Microelectronics NCSR 'Demokritos'
by a crew of PhD physics"
Very high speed sample scanning by rotating the stage and by moving the optical head linearly on top (polar scanning).
625 measurements per minute on an 8 inch wafer, 5 points in 4 sec, 25 points in 9 sec.
No bending or moving fibers, excellent performance
A team of PhD physics offers 24/7 support. Long life time of the light source, 10000 h+, is guaranteed.