12" Mask Aligner & Exposure System - 2-5 kW UV Lamp

Part number: MDA-12SA
Price on quote


Part number
Substrate size
12" (450mm)
System type
Semi Automatic
Light source
2-5 kW UV Lamp

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Mask Aligners Brochure 2017


Product description

12" Mask Aligner & Exposure System

Model: MDA-12SA

The MDA-12FA represents the next generation of Full-Field lithography systems. This model offers a semi-autotomic mask aligner platform with a higher overlay accuracy and more reliable operation the conventional systems. It is great for Ceramic, Probe Card and WLP applications. The MDA-12FA has a higher production and user friendly controls.

  • Type: Joystick control Semi-Auto (Mask Aligner)
  • Mask size: up to 13" x 13"
  • Substrate size: piece to 12" x 12"
  • UV lamp & Power: 2kW & power supply 5kW & Power supply
  • Uniform beam size: 13.25" x 13.25"
  • Beam Uniformity: <5%
  • Beam wavelength: 350 ~ 450nm
  • 365nm Intensity: 15 ~ 20mW/cm2 (2kW) 25 ~ 60mW/cm2 (5kW)
  • Alignment accuracy: 1um
  • Process resolution: 1um@1um PR thickness with vacuum contact
  • Process mode: Soft, Hard, Vacuum contact & Proximity
  • Substrate chuck moving: X ,Y, Z & (theta) (Motorized)
  • Frame: Anti-Vibration system