12" Mask Aligner & Exposure System - 5 kW UV Lamp

Part number: MDA-12FA
Price on quote


Part number
Substrate size
12" (450mm)
System type
Fully Automatic
Light source
5 kW UV Lamp

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Mask Aligners Brochure 2017


Product description

12" Mask Aligner & Exposure System

Model: MDA-12FA

The MDA-12FA represents the next generation of Full-Field lithography systems. This model offers a full autotomic mask aligner platform with a higher overlay accuracy and more reliable operation the conventional systems. The MDA-12SA has a higher production and user friendly controls.

  • Type: Full automatic (Mask Aligner)
  • Mask size: up to 14" x 14"
  • Substrate size: 12" circle
  • UV lamp& Power: 5kW lamp & power supply
  • Uniform beam size: 13.25" x 13.25"
  • Beam Uniformity:<5% >
  • Beam wavelength: 350 ~ 450nm
  • 365nm Intensity: 25~60mW/cm2 (5kW)
  • Alignment accuracy: 1um
  • Process resolution: 1um@1um PR thickness with vacuum contact
  • Process mode: Soft, Hard, Vacuum contact& Proximity
  • Substrate chuck moving: x,y,z& (theta) (Motorized)
  • Pre-aligner: 50um