The MDA-12FA represents the next generation of Full-Field lithography systems. This model offers a full autotomic mask aligner platform with a higher overlay accuracy and more reliable operation the conventional systems. The MDA-12SA has a higher production and user friendly controls.
- Type: Full automatic (Mask Aligner)
- Mask size: up to 14" x 14"
- Substrate size: 12" circle
- UV lamp& Power: 5kW lamp & power supply
- Uniform beam size: 13.25" x 13.25"
- Beam Uniformity:<±5% >
- Beam wavelength: 350 ~ 450nm
- 365nm Intensity: 25~60mW/cm2 (5kW)
- Alignment accuracy: 1um
- Process resolution: 1um@1um PR thickness with vacuum contact
- Process mode: Soft, Hard, Vacuum contact& Proximity
- Substrate chuck moving: x,y,z& (theta) (Motorized)
- Pre-aligner: ±50um