- Type: PC control Semi Automatic System
- Mask size: up to 9" x 9"
- Substrate size: piece to diameter 8"
- UV lamp & Power: 1kW & power supply
- Uniform beam size: 9.25" x 9.25"
- Beam Uniformity: <±5%
- Beam wavelength: 350 ~ 450nm
- 365nm Intensity: 15 ~ 25mW/cm2
- Alignment accuracy: 1um
- Process resolution: 1um@1um PR thickness with vacuum contact
- Process mode: Soft, Hard, Vacuum contact & Proximity
- Substrate chuck moving: X, Y (Manual), Z, (theta) (Motorized)