HARP PMMA and Copolymer e-Beam Resists

Part number: HARP eB & HARP-C
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Specifications

Part number
HARP eB & HARP-C
TAG 1
Positive Photoresist
TAG 2
up to 4.0 µm FT
TAG 3
PMMA e-Beam / Copolymer
Brand

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Documentation

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Product description

HARP™ PMMA (polymethyl methacrylate) e-Beam resist is designed for high resolution direct write e-Beam lithography. When combined with HARP-C™ copolymer, the HARP multi-layer system is ideal for T-gate manufacture. HARP™ PMMA has excellent adhesion to a wide variety of substrates, and is used as a protective coating layer for wafer thinning and sacrificial layers.

Applications
• e-Beam direct write lithography
• Multi-layer T-gate manufacture
• X-Ray LIGA
• Protective Coating for wafer thinning

Safe Solvent
KemLab HARP™ PMMA products are manufactured in safe solvents (anisole and ethyl lactate)