KL5300 series are positive photoresists for use in i-Line, g-Line and broadband applications. They offer high sensitivity, high resolution and excellent process latitude.
- Cover 0 – 2.5 µm in a single coat
- Designed for use with industry standard TMAH 0.26N developers
- Achieve resolution 0.55 µm
- Competes with S1805™, S1808™, S1811™, S1813™, S1818™