SPIN200i-NPP-INT Single Substrate Spin Processor

Part number: 42022
Price on quote
Quantity

Specifications

Part number
42022
TAG 1
Up to 8" (200mm)
TAG 2
NPP
TAG 3
In-Deck Version
Weight (gram)
20 gram
Brand

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Product description

SPIN200i-NPP-INT Single Substrate Spin Processor

Type: In-Deck Version

The POLOS Spin200i is a versatile and high-quality substrate spin coater, made out of PTFE or NPP. It is specifically designed for R&Dand low volume production. The In-Deck Version is suitable for easy integration in your existing or new wetbench.

Suitable for Coating, Cleaning, Rinse/Dry, Developing, Etching, PDMI, and other processes

Specifications:
  • For up to 8" (200mm) Wafers
  • For up to 6" x 6" (150mm) Substrates
  • Material: Natural Polypropylene (NPP)
  • 12.000 RPM (Depending on Substrate / Chuck)
  • High Acceleration and Accuracy
  • Manual Chemical Dispense
  • Central dispensing syringe holder with integrated N2 diffuser
  • CW& CCW Rotation
  • Colour Touchscreen with Customisable Icons
  • USB Port

Including
  • 1 x A-V87-S96-PP-HD - Vacuum Chuck

For more information visit:
www.spincoating.com